Co-Nanomet

critical dimension and scanning probe techniques workshop presentations

O2.1 - The Critical Dimensions and Scaning Probe Techniques within Europe - Current Capability and Future Directions
Dr.-Ing. H-U. Danzebrink
PTB, DE
 
O2.2 - The Critical Dimension Metrology Perspectives and Future Trends in the Semiconductor Industry
Dr. J. Foucher
CEA-LETI, FR
 
O2.3 - An Overview of Industrial Applications for Scanning Probe Microscopy
Dr. S. Lesko
Veeco, FR
 
O2.4 - Electron Microscopy Metrology - Applications and Challenges
Dr. F. de Jong
FEI, NL